CVD diamond wafer -Henan UHD Ultrahard Tools Co., ltd

CVD diamond wafer

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CVD diamond wafer Advantages:

1, Low friction coefficient

2, Excellent wear resistance

3, Excellent thermal stability

4, Good uniformity

5, Good adhesion

6, High fracture stress

7, Chemical stability of any acid and alkali erosion

Specification for CVD Diamond Wafer

Performance	Standard	High Quality
Viker hardness(kg/mm2)	8000	10000
Density(g/cm3)	3.51	3.51
Young’s modulus(GPa)	1000	1100
Thermal conductivity(W/m・K )	>1000	>1000
Chemical stability	Insoluble in all kinds of acid and alkali
Break strength(Mpa)	350	350
Thermal stability	800 °C in the air for 10 minutes. Mechanical strength no change
Wear ratio	200000	>300000
Specific heat(J/gk)	0.52
Friction coefficient	0.05-0.1
Roughness(after polishing)	<30 nm

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